International Journal of Science, Engineering and TechnologyAuthors: Emmanuel O. Okechukwu, Azubuike J. Ekpunobi, Azubogu, A. C. O, Onuigbo, E. N, Overcomer Anusiuba, Adline Nwodo, Diemiruaye M. Jeroh, Chukwudi B. Muomeliri, Chiedozie Okafor, Lynda A. Ozobialu
Abstract: Successfully, thin films of copper (II) sulfide (CuS) and titanium-doped copper (II) sulfide (Ti:CuS) have been deposited on fluorine tin-doped oxide (FTO) glass substrates, using electrodeposition technique, at room temperature. The films were characterized to investigate their optical, structural, morphological, compositional, electrical, and magnetic properties, using UV-Vis spectrophotometer (at wavelength range of 300 nm – 1100 nm), x-ray diffractometer machine, scanning electron microscope equipped with energy dispersive x-ray spectroscope, four-point probe technique, and vibrating sample magnetometer (VSM), respectively. Thickness of the films was obtained using a profilometer, and thickness values of 109.16 nm, 113.17 nm, 121.11 nm, and 131.79 nm were obtained for the undoped CuS thin film, 2 % Ti doped, 6 % Ti doped, and 10 % Ti doped thin films, respectively. Optical bandgap of the films range between 2.40 eV and 2.60 eV. Structural analysis of the films confirmed hexagonal phase of CuS with lattice constant, a₌b ₌ 3.7920 Å and c ₌ 16.3440 Å.
DOI: http://doi.org/10.61463/ijset.vol.13.issue3.179
